Method of forming titanium silicide and titanium by chemical vapor deposition and resulting apparatus

ABSTRACT

A method is provided for forming a contact in an integrated circuit by chemical vapor deposition (CVD). In one embodiment, a titanium precursor and a silicon precursor are contacted in the presence of hydrogen, to form titanium silicide. In another embodiment, a titanium precursor contacts silicon to form to form titanium silicide.

FIELD OF THE INVENTION

[0001] The present invention relates to a method for manufacturing semiconductor devices, and in particular, to a method for forming titanium silicide within electrical contacts and apparatuses including such electrical contacts.

BACKGROUND OF THE INVENTION

[0002] Device density in integrated circuits (ICs) is constantly being increased. To enable the increase in density, device dimensions are being reduced. As the dimensions of device contacts get smaller, device contact resistance increases, and device performance is adversely affected. Methods for decreasing device contact resistance in ICs are needed to obtain enhanced device and IC performance.

[0003] Device contacts with reduced resistance may be created by forming certain metals on a silicon semiconductor base layer. These metals react with the underlying silicon, for example, to form silicides. Silicide device contacts are desirable because they reduce the native oxide on silicon. The native oxide is undesirable because it increases the contact resistance.

[0004] Titanium is preferably used to form silicide device contacts for two reasons. First, titanium silicide has superior gettering qualities. Also, titanium silicide forms low resistance contacts on both polysilicon and single-crystal silicon.

[0005] Device contacts are normally formed with the following process. First, a thin layer of titanium is formed on top of the silicon base layer, such as a substrate. The titanium adjoins active regions exposed by contact holes in an isolating layer, such as an oxide, above the silicon base layer. Then, the silicon base layer is annealed. As a result, the titanium reacts with the active regions of silicon to form titanium silicide.

[0006] Ultimately, an electrically conductive plug material, such as tungsten, fills the contact hole to facilitate external electrical connection to the contact. However, plug materials, such as tungsten, adhere poorly to titanium silicide. Additionally, to ensure low contact resistivity, aluminum or polysilicon plug materials should not be intermixed with the titanium silicide and underlying silicon base layer. Accordingly, a barrier layer is formed over the titanium silicide to prevent diffusion of the titanium silicide and silicon base layer into the plug material. The barrier layer also causes the plug material to adhere to the IC.

[0007] Titanium nitride is a desirable barrier layer because it is an impermeable barrier for silicon, and because the activation energy required for the diffusion of other impurities is very high. Titanium nitride is also chemically and thermodynamically stable, and has a relatively low resistivity. Titanium nitride can be formed on the substrate by (1) evaporating titanium in a nitrogen ambient, (2) reactively sputtering titanium in an argon and nitrogen mixture, (3) sputtering from a titanium nitride target in an inert argon ambient, (4) sputter depositing titanium in an argon ambient, and converting the titanium to titanium nitride subsequently by plasma nitridation, or (5) low pressure chemical vapor deposition (CVD).

[0008] The resistance of device contacts can also be adversely increased by the formation of titanium silicide having small step coverage in the contact hole. As device dimensions shrink, the contact holes become relatively deeper and narrower. Also, the walls of the contact holes become steeper, and closer to vertical. As a result, most metal deposition techniques form conductive layers having relatively small step coverage. As a result, a void, or keyhole, forms in the plug material. The void increases contact resistivity and diminishes contact reliability. Hence, IC performance is degraded. Thus, there is a need for forming contacts with reduced resistivity. Specifically, there is a need for a method of forming contacts without voids.

SUMMARY OF THE INVENTION

[0009] The present invention solves the above-mentioned problems in the art and other problems which will be understood by those skilled in the art upon reading and understanding the present specification. The present invention includes a method for forming titanium silicide and/or titanium by chemical vapor deposition (CVD), and apparatus formed by such a method. The method comprises cleaning a contact hole. A titanium precursor and a silicon precursor are combined in the presence of hydrogen (H₂). Titanium silicide is formed by CVD.

[0010] In another embodiment, the method includes combining a titanium precursor in the presence of hydrogen (H₂). Then, titanium silicide is formed by CVD on an exposed silicon surface of a contact hole.

[0011] In another embodiment, the method includes forming titanium by CVD on a conductor according to the following chemical process:

TiCl₄+H₂→Ti+HCl.

[0012] In yet another embodiment, the method includes forming titanium by CVD on an insulator according to the following chemical process:

TiCl₄+H₂→Ti+HCl

[0013] In yet another embodiment, the method includes forming titanium silicide according to the following chemical process:

TiCl₄+Si_(n)H_(2n+2)+H₂→TiSi_(x)+HCl,

[0014] wherein TiCl₄ is the titanium precursor, Si_(n)H_(2n+2) is the silicon precursor, x is less than or equal to 2, and n is greater than or equal to 1.

[0015] In yet another embodiment, the titanium suicide is also formed according to the following chemical process:

TiCl₄+Si+H₂→TiSi_(x)+HCl,

[0016] wherein x is less than or equal to 2.

[0017] In one embodiment, the apparatus is a memory, comprising a memory array, a control circuit, operatively coupled to the memory array, and address logic, operatively coupled to the memory array and the control logic. The memory array, control circuit and address logic, each including a contact. The contact includes titanium silicide. Titanium nitride is formed on the titanium silicide. A plug material is formed on the titanium nitride. The plug material is substantially solid. In another embodiment, the titanium silicide formed on an exposed silicon base layer, and the exposed silicon base layer is not substantially depleted.

[0018] In yet another embodiment, the apparatus is a system, comprising a memory, and a processor coupled to the memory. The memory includes a contact. The contact includes titanium silicide. Titanium nitride is formed on the titanium silicide. A plug material is formed on the titanium nitride. The plug material is substantially solid. In yet another embodiment, the titanium silicide formed on an exposed silicon base layer, and the exposed silicon base layer is not substantially depleted.

[0019] It is an advantage of the present invention that the contacts have reduced resistivity. It is a further benefit that the contacts have increased reliability.

BRIEF DESCRIPTION OF THE FIGURES

[0020]FIG. 1A is a cross-sectional view of a contact hole that has been etched through an insulator to an underlying semiconductor substrate.

[0021]FIG. 1B is a cross-sectional view of the contact hole of FIG. 1A, comprising a silicide film formed thereon by one aspect of the present invention.

[0022]FIG. 1C is a cross-sectional view of the contact hole of FIG. 1B, further comprising a barrier layer and plug material.

[0023]FIG. 2A is a cross-sectional view of the contact hole of FIG. 1A, comprising a silicide film formed thereon by another aspect of the invention.

[0024]FIG. 2B is a cross-sectional view of the contact hole of FIG. 2A, further comprising a barrier layer and plug material.

[0025]FIG. 2C is a cross-sectional view of a contact hole comprising a conductor, a barrier layer, and plug material.

[0026]FIG. 3A is a cross-sectional view of a contact hole that has been etched into an insulator.

[0027]FIG. 3B is a cross-sectional view of the contact hole of FIG. 3A, further comprising a silicide film, a barrier layer and plug material formed thereon by another aspect of the invention.

[0028]FIG. 4 is a block diagram of a memory.

[0029]FIG. 5 is a block diagram of a memory coupled to an external system.

DETAILED DESCRIPTION OF THE INVENTION

[0030] In order to manufacture a contact in an integrated circuit (IC) 11, a contact hole 10, as illustrated in FIG. 1A, is etched through an insulator 12, such as borophosphosilicate glass (BPSG) or silicon dioxide, to expose a portion of the underlying silicon base layer 14, to which electrical contact is to be made. The exposed silicon base layer 14 is generally an active region 15 of a transistor in the IC 11. An optional in-situ clean of the contact hole 10 may then be performed with a wet chemical clean, or a plasma, such as a high density Ar/NF₃ plasma.

[0031] Chemical vapor deposition (CVD) is then used to form titanium silicide 16, such as TiSi_(x), at the bottom of contact hole 10, as shown in FIG. 1B. CVD permits accurately controlled formation of films, including conformal films.

[0032] CVD techniques are well known by persons skilled in the art, and are described in Panson et al., Appl. Phys. Lett., 53, 1756 (1988) and Cowher et al., J. Cryst. Growth, 46, 399 (1979), hereby incorporated by reference. Any CVD apparatus design may be used when practicing the present invention including hot wall reactors, cold wall reactors, radiation beam assisted reactors, and plasma-assisted reactors. These CVD apparatuses are disclosed in C. E. Morosanu, “Thin Films by Chemical Vapor Deposition,” Elsevier, N.Y. (1990), pages 42-54; I. P. Herman, Chemical Reviews, 89, 1323 (1989); U.S. Pat. No. 4,876,112; U.S. Pat. No. 5,005,519; U.S. Pat No. 4,340,617; U.S. Pat No. 4,713,258; U.S. Pat. No. 4,721,631; U.S. Pat. No. 4,923,717; U.S. Pat No. 5,022,905; U.S. Pat. No. 4,868,005; U.S. Pat. No. 5,173,327, and Bachman et al., MRS Bull., 13, 52 (1988), hereby incorporated by reference.

[0033] For blanket depositions, a cold wall-hot substrate reactor is sometimes preferred, as this design is efficient in regard to precursor consumption. For depositions on selection areas, a radiation beam assisted reactor may be preferred as the radiation beam may be used to selectively deposit metal containing films onto small areas of the substrate.

[0034] Different embodiments for forming titanium silicide, which may use plasma-assisted CVD (PACVD) and non-plasma CVD, are subsequently described. In a first embodiment, CVD is utilized to deposit a film of titanium silicide 16 on the top and side walls of the insulator 12, as illustrated in FIG. 1B. The titanium silicide 16 is preferably formed as a conformal film, and thus has high step coverage. This embodiment will now be described in further detail.

[0035] The IC 11 is mounted on a substrate holder in a chamber of the CVD apparatus. A titanium precursor, such as titanium tetrachloride (TiCl₄) and a silicon precursor, such as silane (Si_(n)H_(2n+2)), for example either SiH₄ or Si₂H₆, are combined with hydrogen (H₂) in the CVD apparatus to form the titanium silicide 16 in and around the contact hole 10, as illustrated in FIG. 1B. The following general chemical process (I) is used:

TiCl₄+Si_(n)H_(2n+2)+H₂→TiSi_(x)+HCl  (I),

[0036] wherein, generally, n is greater than or equal to 1, and x is less than or equal to 2.

[0037] When PACVD is used, the deposition takes place in a water cooled quench chamber having a volume of approximately 6 liters. The power supply for generating a plasma can be any type of energy source, such as radio frequency (RF) or direct current (DC). When a RF power source is used, the radio frequency is approximately 13.6 MHZ. However, the present invention envisions using higher or lower frequencies. The power of the energy source used to create the plasma is between approximately 10 and 1,000 Watts, preferably approximately 600 Watts. The IC 11 is heated to a temperature between approximately 300 and 800 degrees Celsius, preferably approximately 500 degrees Celsius.

[0038] In the first embodiment, the precursor gases TiCl₄ and Si_(n)H_(2n+2) are delivered to a plasma flame. TiCl₄ is introduced at a flow rate of between approximately 1 and 40 sccm, preferably approximately 20 sccm. If SiH₄ is used, the SiH₄ is introduced at a flow rate of between approximately 0.5 and 100 sccm, preferably approximately 50 sccm. Alternatively, Si₂H₆ may be used, and is introduced at a flow rate of between approximately 0.05 and 50 sccm, preferably approximately 25 sccm. A sheath gas, selected from a group consisting of the noble gases and hydrogen, is employed in order to direct the plasma flame. In this example, hydrogen is introduced at a flow rate between approximately 500 and 5,000 sccm, preferably approximately 3,000 sccm. Optionally, a carrier gas, such as argon, is also introduced at a flow rate between approximately 500 and 5,000 sccm, preferably approximately 2,000 sccm.

[0039] A precursor compound, including silicon and titanium precursors, becomes a plasma gas. The precursor compound is transported via a reactor tube to the chamber. The precursor plasma, upon coming into contact with the heated IC 11, pyrolyzes and deposits a film of TiSi_(x) 16 on the exposed surfaces of the insulator 12. The chamber pressure is between approximately 0.1 and 100 Torr, preferably approximately 5 Torr. The reaction products from the pyrolysis of the precursor compound exit from the chamber via an exhaust manifold.

[0040] For this embodiment, x is typically 2. However, x may be less than 2 when the silane flow rate is relatively low, and when TiCl₄ precursor flow rate is relatively high.

[0041] Alternatively, when using a non-plasma CVD method, the process parameters generally remain the same. However, in the absence of the plasma, the process temperature is increased to between approximately 600 and 900 degrees Celsius, preferably approximately 700 degrees Celsius.

[0042] Titanium silicide is typically formed on the exposed surface of the silicon base layer 14 when the titanium precursor and hydrogen contact the silicon base layer 14. This reaction is described by the following general chemical process (II):

TiCl₄+Si+H₂→TiSi₂+HCl  (II)

[0043] However, process (II) may remove exposed silicon base layer that is the active region 15. Titanium silicide 16 will then intrude into the active region where the exposed silicon base layer was removed. The active region 15 is highly doped to reduce contact resistance. As a result of the removal, the contact resistance will undesirably increase. Therefore, preferably, sufficient silane is preferably added to the precursor compound by regulating the silane flow rate. As a result, titanium silicide over the exposed silicon base layer is at least partially formed according to process (I). Hence, the exposed silicon will not be substantially depleted. Therefore, the contact resistance will not be detrimentally increased.

[0044] In a second embodiment, CVD is used to selectively deposit a film of titanium silicide 16 on the exposed silicon base layer according to process (II), described above. If PACVD is used, the IC 11 is heated to between approximately 400 and 800 degrees Celsius. Simultaneously, a substantially thinner layer of titanium 17 is deposited on the sidewalls of the contact hole 10, as illustrated in FIG. 2A. The titanium 17 is deposited according to chemical process (III):

TiCl₄+H₂→Ti+HCl  (III)

[0045] As illustrated in FIG. 2B, the titanium 17 formed on the sidewalls of the insulator 12 is substantially thinner than the titanium silicide 16 formed on the base of the contact hole 10. Thus, in the event the titanium 17 on the sidewalls is formed with a retrograde, a there will be substantially no voids in the subsequently formed plug material 20, illustrated in FIG. 2C. Hence, the plug-material 20 is substantially solid. The titanium 17 formed on the top of the insulator 12 is substantially thicker than the titanium 17 formed on the sidewalls of the conductor 12.

[0046] The second embodiment may be implemented, for example, at a temperature of approximately 630 degrees Celsius, a pressure of approximately 5 Torr, an H₂ flow rate of approximately 5 slm, and a TiCl₄ flow rate of approximately 40 sccm. A carrier gas, such as argon, having a flow rate of approximately 5 slm, may also be used. As a result, a 500 Angstrom layer of titanium 17 is formed on the exterior surfaces 22 of the insulator 12. Little or no titanium 17 is formed in the contact hole 10, such as on the sidewalls 24 and over the active region 15, as illustrated in FIG. 2A. Additionally, approximately 2500 Angstroms of titanium silicide 16 is formed over the active region 15. Alternatively, the second embodiment may be implemented at a temperature of less than about 550 degrees Celsius. As a result, about 1250 Angstroms of titanium 17, rather than titanium silicide 16, are formed over the active region 15. The titanium 17 is subsequently converted to titanium silicide during an anneal.

[0047] Chemical process (III), described above, may also be used to form a contact to a conductor 21 on an IC 11, as illustrated in FIG. 2C. The conductor 21 is typically formed over a second insulator 23 on the IC 11. The titanium 17 formed on the sidewalls of the contact hole 10 is substantially thinner than the titanium 17 formed on the base of the contact hole 10. Thus, in the event the titanium 17 on the sidewalls is formed with a retrograde, a there will be substantially no voids in the subsequently formed plug material 20, illustrated in FIG. 2C.

[0048] In a third embodiment, titanium silicide 16 can be formed in a contact hole 10 in insulator 14, where no silicon base layer 12 is exposed, as illustrated in FIG. 3A. A conformal layer of titanium silicide 16 having high step coverage is formed in the contract hole 10, according to general chemical process (I) described above. For the first, second and third embodiments, the reaction products of general chemical processes (I) and (II) may also include SiCl₄.

[0049] Typically, after the titanium silicide 16 has been formed according to one of the embodiments described above, the barrier layer 18 is then formed in the contact hole, as illustrated in FIGS. 1C, 2B and 3B. The IC 11 may be heated before or after barrier layer 18 formation. Heating may be accomplished, for example, in a rapid thermal annealer or a furnace, in a manner known to persons skilled in the art. The heating step can convert titanium 17 proximate to exposed silicon to titanium silicide 16. Additionally, heating of previously formed titanium silicide 16 is desirable because it reduces native oxides. The plug material 20 is then formed over the barrier layer 18 to complete contact formation. The barrier layer 18 and plug material 20 may each be formed by CVD.

[0050] The aforementioned processes may be used to form contacts in an integrated circuit 11 that is a memory 400, such as a dynamic random access memory. The memory 400 may include a memory array 402, control logic 404, and address logic 406 coupled in a manner known to one skilled in the art and exemplified in FIG. 4. Each of the aforementioned elements of the memory 400 includes contacts formed in the manner described above. The memory 400 may be coupled to an external system 524, such as a processor, as illustrated in FIG. 5.

[0051] The present invention provides a method for forming low resistivity, high reliability contacts. It is to be understood that the above description is intended to be illustrative, and not restrictive. Many other embodiments will be apparent to those of skill in the art upon reviewing the above description. For example, other titanium precursors, such as tetradimethyl amino titanium (TDMAT) can be used to form titanium 17 and titanium silicide 16. Additionally, the present invention may be implemented with any CVD apparatus 29, including hot wall reactors, cold wall reactors, radiation beam assisted reactors, plasma-assisted reactors, and the like. Hence, the scope of the invention should, therefore, be determined with reference to the appended claims, along with the full scope of equivalents to which such claims are entitled. 

What is claimed is:
 1. A method of forming a contact, comprising the steps of: cleaning a contact hole prior to forming titanium silicide; combining a titanium precursor and a silicon precursor in the presence of hydrogen (H₂); and forming the titanium silicide by CVD on an exposed silicon base layer.
 2. The method of claim 2 , wherein the step of forming the titanium silicide comprises the step of forming titanium silicide according to chemical process (I): TiCl₄+Si_(n)H_(2n+2)+H₂→TiSi_(x)+HCl  (I);andwherein TiCl₄ is the titanium precursor, Si_(n)H_(2n+2) is the silicon precursor, and n is greater than or equal to
 1. 3. The method of claim 2 , wherein the step of forming titanium silicide further comprises the step of forming the titanium silicide according to chemical process (II): TiCl₄+Si+H₂→TiSi_(x)+HCl  (II);andwherein x is less than or equal to
 2. 4. The method of claim 3 , wherein the step of forming the titanium silicide comprises optimizing the amount of Si_(n)H_(2n+2) added to a precursor compound to diminish removal of the exposed silicon base layer.
 5. The method of claim 2 , wherein the step of forming the titanium silicide further comprises forming titanium silicide according to chemical process (I) which additionally includes SiCl₄ as a reaction product.
 6. The method of claim 3 , wherein the step of forming the titanium silicide further comprises forming titanium silicide according to chemical processes (I) and (II) which additionally include SiCl₄ as a reaction product.
 7. The method of claim 2 , wherein the step of combining further comprises the step of combining the silicon precursor that is SiH₄, which is introduced into a CVD chamber at a flow rate between approximately 0.5 and 100 sccm.
 8. The method of claim 2 , wherein the step of combing comprises the step of combining the silicon precursor that is Si₂H₆, which is introduced into a CVD chamber at a flow rate of approximately 0.05 to 50 sccm.
 9. The method of claim 2 , wherein the step of combining comprises the step of combining in a CVD chamber that is plasma-assisted; and wherein the step of forming titanium silicon comprises heating a contact hole to between approximately 300 and 800 degrees Celsius.
 10. The method of claim 2 , wherein the step of combining comprises the step of combining in a CVD chamber that is plasma-assisted; and wherein the plasma is created by an energy source that uses between approximately 10 and 1,000 Watts.
 11. The method of claim 2 , wherein the step of combining comprises the step of combining in a CVD chamber is a non-plasma chamber; and wherein the step of forming titanium silicide comprises heating a contact hole to between approximately 600 and 900 degrees Celsius.
 12. The method of claim 2 , wherein the step of combining comprises the step of introducing the TiCl₄ in a CVD chamber at a flow rate between approximately 1 and 40 sccm.
 13. The method of claim 2 , wherein the step of combining comprises the step of introducing the H₂ in a CVD chamber at a flow rate between approximately 500 and 5,000 sccm.
 14. The method of claim 13 , wherein the step of combining comprises the step of introducing argon into a CVD chamber at a flow rate between approximately 500 and 5,000 sccm.
 15. The method of claim 2 , further comprising the step of operating a CVD chamber at a pressure between approximately 0.1 and 100 Torr.
 16. The method of claim 2 , further comprising the steps of: forming a barrier layer on the titanium silicide; and forming a plug material on the barrier layer.
 17. A method for forming a contact, comprising the steps of: cleaning a contact hole prior to forming titanium silicide; combining a titanium precursor in the presence of hydrogen (H₂); and forming titanium silicide by CVD on an exposed silicon base layer.
 18. The method of claim 17 , further comprising the step of forming titanium on an insulator according to chemical process (III): TiCl₄+H₂→Ti+HCl  (I);andwherein the step of forming the titanium silicide comprises the step of forming the titanium silicide according to chemical process (IV): TiCl₄+Si+H₂→TiSi_(x)+HCl  (IV), wherein the titanium precursor is TiCl₄; and x is less than or equal to
 2. 19. The method of claim 18 , wherein the step of forming titanium silicide comprises the step of forming titanium silicide according to chemical process (IV), which additionally includes SiCl₄ as a reaction product.
 20. The method of claim 18 , wherein the step of combining comprises the step of combining a CVD chamber that is plasma-assisted; and wherein the step of forming titanium silicide comprises heating a contact hole to between approximately 400 and 800 degrees Celsius.
 21. The method of claim 18 , wherein the step of combining comprises the step of combining a CVD chamber that is plasma-assisted; and wherein the plasma is created by an energy source that uses between approximately 10 and 1,000 Watts.
 22. The method of claim 18 , wherein the step of combining comprises the step of combining a CVD chamber that is a non-plasma chamber; and wherein the step of forming titanium silicide comprises heating a contact hole to between approximately 600 and 900 degrees Celsius.
 23. The method of claim 18 , wherein the step of combining comprises the step of introducing the TiCl₄ in a CVD chamber at a flow rate between approximately 1 and 40 sccm.
 24. The method of claim 18 , wherein the step of combining comprises the step of introducing the H₂ in a CVD chamber at a flow rate between approximately 500 and 5,000 sccm.
 25. The method of claim 18 , wherein the step of combining comprises the step of introducing argon into a CVD chamber at a flow rate between approximately 500 and 5,000 sccm.
 26. The method of claim 18 , further comprising the step of operating a CVD chamber at a pressure between approximately 0.1 and 100 Torr.
 27. The method of claim 18 , further comprising the steps of: forming a barrier layer on the titanium silicide; and forming a plug material on the barrier layer.
 28. The method of claim 18 , wherein the step of forming titanium comprises the step of forming titanium on sidewalls of a contact hole that is substantially thinner than the titanium silicide on the base of the contact hole.
 29. The method of claim 17 , wherein the step of forming titanium silicide further comprises the steps of: forming titanium on an insulator and an exposed silicon base layer according to chemical process (V): TiCl₄+H₂→Ti+HCl  (V);and annealing the titanium.
 30. A method for forming a contact, comprising the steps of: cleaning a contact hole prior to forming titanium; forming the titanium by CVD on a conductor according to chemical process (VI): TiCl₄+H₂→Ti+HCl  (VI); forming a barrier layer on the titanium; and forming a plug material on the barrier layer.
 31. The method of claim 30 , wherein the step of forming titanium comprises the step of forming titanium on sidewalls of a contact hole that is substantially thinner than the titanium on the base of the contact hole.
 32. A method for forming a contact, comprising the steps of: cleaning a contact hole prior to forming titanium; forming the titanium by CVD on an insulator according to chemical process (VII): TiCl₄+H₂→Ti+HCl  (VII); forming by a barrier layer on the titanium; and forming by a plug material on the barrier layer.
 33. A method of forming a contact, comprising the steps of: cleaning a contact hole with a high density Ar/NF₃ plasma; operating a CVD chamber at a pressure between approximately 0.1 and 100 Torr; heating the contact hole to between approximately 300 and 700 degrees Celsius; introducing TiCl₄ into the CVD chamber at a flow rate between approximately 5 and 40 sccm; introducing H₂ into a CVD chamber at a flow rate between approximately 1,000 and 5,000 sccm; introducing argon into a CVD chamber at a flow rate between approximately 500 and 5,000 sccm; forming titanium silicide by plasma assisted CVD in the CVD chamber according to chemical processes (VII) and (IX): $\begin{matrix} {\left. {{TiCl}_{4} + {{Si}_{n}H_{{2n} + 2}} + H_{2}}\rightarrow{{TiSi}_{x} + {HCl}} \right.,{and}} & ({VIII}) \\ {\left. {{TiCl}_{4} + {Si} + H_{2}}\rightarrow{{TiSi}_{x} + {HCl}} \right.;} & ({IX}) \end{matrix}$

forming a barrier layer on the titanium silicide; forming by CVD a plug material on the barrier layer; wherein n is greater than or equal to 1, and x is less than or equal to 2; and wherein a plasma in the CVD chamber is created by an energy source that uses between approximately 100 and 1,000 Watts.
 34. A memory, comprising: a memory array; a control circuit, operatively coupled to the memory array; address logic, operatively coupled to the memory array and the control logic; wherein the memory array, control circuit and address logic each include a contact comprising, titanium silicide, titanium nitride on the titanium silicide, and plug material on the titanium nitride; and wherein the plug material is substantially solid.
 35. A memory, comprising: a memory array; a control circuit, operatively coupled to the memory array; address logic, operatively coupled to the memory array and the control logic; wherein the memory array, control circuit and address logic each include a contact comprising, titanium silicide formed on an exposed silicon base layer, titanium nitride on the titanium silicide, and plug material on the titanium nitride; and wherein the exposed silicon base layer is not substantially depleted.
 36. A system, comprising: a memory; and a processor coupled to the memory; wherein the memory array, control circuit and address logic each include a contact comprising, titanium silicide, titanium nitride on the titanium silicide, and plug material on the titanium nitride; and wherein the plug material is substantially solid.
 37. A system, comprising: a memory; and a processor coupled to the memory; wherein the memory array, control circuit and address logic each include a contact comprising, titanium silicide formed on an exposed silicon base layer, titanium nitride on the titanium silicide, and plug material on the titanium nitride; and wherein the exposed silicon base layer is not substantially depleted. 